Summer Processing Lab: Week 7 (7/21)

This week marks the Physical Vapor Deposition (PVD) of aluminum onto the freshly exposed wafers, using thermal vaporization. This provides the contact areas to the capacitor surfaces. This was conducted at ~3 µTorr, using a Tungsten boat to melt the Aluminum, with current ranging from 80-180 Amperes. The amperage was increased by 5 every 15 seconds until the aluminum sample was completely vaporized.